Monolayer Capping Provides Close to Optimal Resistance to Laser Dewetting of Au Films (2023)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acsaelm.3c00052

Publication URI: http://dx.doi.org/10.1021/acsaelm.3c00052

Type: Journal Article/Review

Parent Publication: ACS Applied Electronic Materials

Issue: 8