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Broadband, wide-angle antireflection in GaAs through surface nano-structuring for solar cell applications (2020)

First Author: Behera S

Attributed to: In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1038/s41598-020-63327-7

PubMed Identifier: 32286418

Publication URI: http://europepmc.org/abstract/MED/32286418

Type: Journal Article/Review

Parent Publication: Scientific Reports

Issue: 1

ISSN: 2045-2322