Resistless EUV lithography: Photon-induced oxide patterning on silicon (2023)
Attributed to:
Atomically Deterministic Doping and Readout For Semiconductor Solotronics (ADDRFSS)
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1126/sciadv.adf5997
Publication URI: http://dx.doi.org/10.1126/sciadv.adf5997
Type: Journal Article/Review
Parent Publication: Science Advances
Issue: 16