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Resistless EUV lithography: Photon-induced oxide patterning on silicon. (2023)

First Author: Tseng LT

Attributed to: Atomically Deterministic Doping and Readout For Semiconductor Solotronics (ADDRFSS) funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1126/sciadv.adf5997

PubMed Identifier: 37075116

Publication URI: http://europepmc.org/abstract/MED/37075116

Type: Journal Article/Review

Volume: 9

Parent Publication: Science advances

Issue: 16

ISSN: 2375-2548