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Focused electron beam deposited silicon dioxide derivatives for nano-electronic applications (2022)

First Author: Chapman G

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mssp.2022.106736

Publication URI: http://dx.doi.org/10.1016/j.mssp.2022.106736

Type: Journal Article/Review

Parent Publication: Materials Science in Semiconductor Processing

ISSN: 13698001