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Influence of co-reactants on surface passivation by nanoscale hafnium oxide layers grown by atomic layer deposition on silicon (2024)

First Author: Pain S

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/d3lf00210a

Publication URI: http://dx.doi.org/10.1039/d3lf00210a

Type: Journal Article/Review

Parent Publication: RSC Applied Interfaces

Issue: 3