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Effects of post-deposition vacuum annealing on film characteristics of p-type Cu$_{2}$O and its impact on thin film transistor characteristics (2016)

First Author: Han S

Attributed to: The Physics and Engineering of Oxide Semiconductors for Large-Area CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.17863/cam.6841

Publication URI: https://www.repository.cam.ac.uk/handle/1810/261630

Type: Journal Article/Review