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Resistless EUV lithography: photon-induced oxide patterning on silicon (2023)

First Author: Tseng L

Attributed to: Atomically Deterministic Doping and Readout For Semiconductor Solotronics (ADDRFSS) funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.48550/arxiv.2310.01268

Publication URI: https://arxiv.org/abs/2310.01268

Type: Other