Role of ALD Al2O3 surface passivation on the performance of p-type Cu2O thin film transistors (2020)

First Author: Napari M
Attributed to:  Precision Manufacturing of Flexible CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.48550/arxiv.2010.10928

Publication URI: https://arxiv.org/abs/2010.10928

Type: Preprint