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Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge (2024)

First Author: Ehiasarian A

Attributed to: Robust manufacturable antimicrobial surfaces enabled by superhard plasmon-enhanced photocatalytic materials funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1116/6.0003277

Publication URI: http://dx.doi.org/10.1116/6.0003277

Type: Journal Article/Review

Parent Publication: Journal of Vacuum Science & Technology A

Issue: 2