Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge (2024)
Attributed to:
Robust manufacturable antibacterial surfaces enabled by superhard plasmon-enhanced photocatalytic materials.
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1116/6.0003277
Publication URI: http://dx.doi.org/10.1116/6.0003277
Type: Journal Article/Review
Parent Publication: Journal of Vacuum Science & Technology A
Issue: 2