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Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp')2] (dmamp' = 2-dimethylamino-2-methyl-1-propanolate). (2021)

First Author: Wilson RL

Attributed to: University College London - Equipment Account funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/d1ra03263a

PubMed Identifier: 35480804

Publication URI: http://europepmc.org/abstract/MED/35480804

Type: Journal Article/Review

Volume: 11

Parent Publication: RSC advances

Issue: 36

ISSN: 2046-2069