Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp')2] (dmamp' = 2-dimethylamino-2-methyl-1-propanolate). (2021)
Attributed to:
University College London - Equipment Account
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1039/d1ra03263a
PubMed Identifier: 35480804
Publication URI: http://europepmc.org/abstract/MED/35480804
Type: Journal Article/Review
Volume: 11
Parent Publication: RSC advances
Issue: 36
ISSN: 2046-2069