Role of ALD Al2O3 Surface Passivation on the Performance of p-Type Cu2O Thin Film Transistors. (2021)

First Author: Napari M
Attributed to:  Centre for Advanced Materials for Integrated Energy Systems (CAM-IES) funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.17863/cam.62891

Publication URI: https://www.repository.cam.ac.uk/handle/1810/315778

Type: Journal Article/Review