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Circumventing the ammonia-related growth suppression for obtaining regular GaN nanowires by HVPE (2024)

First Author: Semlali E

Attributed to: Displacement Talbot Lithography: accelerating a versatile and low-cost patterning technique for precision manufacturing funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/1361-6528/ad3741

PubMed Identifier: 38522101

Publication URI: http://europepmc.org/abstract/MED/38522101

Type: Journal Article/Review

Parent Publication: Nanotechnology

Issue: 26

ISSN: 0957-4484