Effect of Plasma Treatment on Metal Oxide p-n Thin Film Diodes Fabricated at Room Temperature (2021)

First Author: Khong Y
Attributed to:  The Physics and Engineering of Oxide Semiconductors for Large-Area CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.17863/cam.65383

Publication URI: https://www.repository.cam.ac.uk/handle/1810/318266

Type: Journal Article/Review