Optical dielectric properties of HfO2-based films (2022)
Attributed to:
ECCS - EPSRC Development of uniform, low power, high density resistive memory by vertical interface and defect design
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.17863/cam.89190
Publication URI: https://www.repository.cam.ac.uk/handle/1810/341766
Type: Journal Article/Review