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Versatile fitting approach for operando spectroscopic imaging ellipsometry of HfS ₂ oxidation (2024)

First Author: Chirca I

Attributed to: Self-limiting Growth Mechanisms for Stable Monolayer Films of Non-van-der-Waals Oxides funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.17863/cam.109704

Publication URI: https://www.repository.cam.ac.uk/handle/1810/370210

Type: Journal Article/Review