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Atomic Layer Deposition of Hafnium Oxide Passivating Layers on Silicon: Impact of Precursor Selection (2024)

First Author: Pain S

Attributed to: EPRSC Resource Only Strategic Equipment: the Warwick Analytical Science Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/pssr.202400202

Publication URI: http://dx.doi.org/10.1002/pssr.202400202

Type: Journal Article/Review

Parent Publication: physica status solidi (RRL) - Rapid Research Letters

Issue: 1

ISSN: 1862-6254