📣 Try out the NEW Gateway to Research and let us know what you think.

We're looking for users to test the new service during August and September and share their feedback. Express your interest by completing this short form.

Control of SAG-GaN at the Nanoscale (2024)

First Author: Semlali E

Attributed to: Displacement Talbot Lithography: accelerating a versatile and low-cost patterning technique for precision manufacturing funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acs.cgd.4c00925

Publication URI: http://dx.doi.org/10.1021/acs.cgd.4c00925

Type: Journal Article/Review

Parent Publication: Crystal Growth & Design

Issue: 21