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Fabrication of uniform, periodic arrays of exotic AlN nanoholes by combining dry etching and hot selective wet etching, accessing geometries unrealisable from wet etching of planar AlN (2025)

First Author: Armstrong R

Attributed to: Manufacturing of nano-engineered III-N semiconductors: Equipment Business Case funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2024.112263

Publication URI: http://dx.doi.org/10.1016/j.mee.2024.112263

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering