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Tracing the two- to three-dimensional transition in InAs/GaAs sub-monolayer quantum dot growth (2020)

First Author: Han I

Attributed to: In-situ Interference lithography: a new manufacturing approach for the production of nanostructured arrays funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2020.146713

Publication URI: http://dx.doi.org/10.1016/j.apsusc.2020.146713

Type: Journal Article/Review

Parent Publication: Applied Surface Science