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Impact of precursor dosing on the surface passivation of AZO/AlO x stacks formed using atomic layer deposition. (2025)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/d4ya00552j

PubMed Identifier: 39958755

Publication URI: http://europepmc.org/abstract/MED/39958755

Type: Journal Article/Review

Volume: 4

Parent Publication: Energy advances

Issue: 4

ISSN: 2753-1457