Contact-Engineering of Self-Aligned-Gate Metal Oxide Transistors Processed via Electrode Self-Delamination and Rapid Photonic Curing (2024)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/adfm.202406044
Publication URI: http://dx.doi.org/10.1002/adfm.202406044
Type: Journal Article/Review
Parent Publication: Advanced Functional Materials
Issue: 41