Electron beam lithography and dimensional metrology for fin and nanowire devices on Ge, SiGe and GeOI substrates (2023)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2023.112071
Publication URI: http://dx.doi.org/10.1016/j.mee.2023.112071
Type: Journal Article/Review
Parent Publication: Microelectronic Engineering