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Electron beam lithography and dimensional metrology for fin and nanowire devices on Ge, SiGe and GeOI substrates (2023)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2023.112071

Publication URI: http://dx.doi.org/10.1016/j.mee.2023.112071

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering