Controlling the silicon nanowire tapering angle in dense arrays of silicon nanowires using deep reactive ion etching (2013)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1116/1.4793500
Publication URI: http://dx.doi.org/10.1116/1.4793500
Type: Journal Article/Review
Parent Publication: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Issue: 2
ISSN: 21662754 21662746