Large area fabrication of complex periodic nanostructures by 'Double Displacement Talbot Lithography': Fundamentals and applications (2019)
Attributed to:
Manufacturing of nano-engineered III-nitride semiconductors
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Type: Other
Parent Publication: International Conference on Metamaterials, Photonic Crystals and Plasmonics
ISSN: 24291390