HEMT With Ultralow Contact Resistance by Room Temperature Process With One-Step EBL T-Shape Gates for Subterahertz Applications: Design, Fabrication, and Characterization (2025)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/ted.2024.3499935
Publication URI: http://dx.doi.org/10.1109/ted.2024.3499935
Type: Journal Article/Review
Parent Publication: IEEE Transactions on Electron Devices
Issue: 1