Reverse pulse strategies for silicon dioxide thin films deposition by high power impulse magnetron sputtering (2025)
Abstract
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Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.surfcoat.2025.132117
Publication URI: http://dx.doi.org/10.1016/j.surfcoat.2025.132117
Type: Journal Article/Review
Parent Publication: Surface and Coatings Technology
ISSN: 0257-8972