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Atomic layer deposited Ta2O5: From process optimization to thin film characterization (2025)

First Author: Chen X

Attributed to: Innovative Material, Processes and Devices for Low Power Flexible Electronics: Creating a Sustainable Internet of Everything funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/6.0004254

Publication URI: http://dx.doi.org/10.1063/6.0004254

Type: Journal Article/Review

Parent Publication: AIP Advances

Issue: 4