📣 Help Shape the Future of UKRI's Gateway to Research (GtR)

We're improving UKRI's Gateway to Research and are seeking your input! If you would be interested in being interviewed about the improvements we're making and to have your say about how we can make GtR more user-friendly, impactful, and effective for the Research and Innovation community, please email gateway@ukri.org.

Antiphase boundary-free III-V materials epitaxially grown on on-axis silicon (001) substrates by ultra-thin silicon buffer (2025)

First Author: Zhang X
Attributed to:  Future Compound Semiconductor Manufacturing Hub funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/5.0259915

Publication URI: http://dx.doi.org/10.1063/5.0259915

Type: Journal Article/Review

Parent Publication: APL Materials

Issue: 4

ISSN: 2166-532X