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Impact of positioning error in double displacement Talbot lithography (2025)

First Author: Fan P

Attributed to: Displacement Talbot Lithography: accelerating a versatile and low-cost patterning technique for precision manufacturing funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1364/oe.558292

Publication URI: http://dx.doi.org/10.1364/oe.558292

Type: Journal Article/Review

Parent Publication: Optics Express

Issue: 14