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Rapid Nanocellulose Wet Nanoimprint Lithography for Tunable Structural Color (2025)

First Author: Mao H

Attributed to: Displacement Talbot Lithography: accelerating a versatile and low-cost patterning technique for precision manufacturing funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acsnano.5c15904

Publication URI: http://dx.doi.org/10.1021/acsnano.5c15904

Type: Journal Article/Review

Parent Publication: ACS Nano

Issue: 1