First-principles mechanism of TDMAH adsorption on pristine and laser-functionalized graphene toward area-selective atomic layer deposition of HfO2 (2026)
Attributed to:
West of Scotland Supercomputing Centre for Academia and Industry (Capital)
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2026.166554
Publication URI: http://dx.doi.org/10.1016/j.apsusc.2026.166554
Type: Journal Article/Review
Parent Publication: Applied Surface Science