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Scalable Growth and Properties of (Al x Ga 1 - x ) 2 O 3 Thin Films on 2- and 4-Inch Sapphire via Close-Coupled Showerhead MOCVD (2026)

First Author: Llewelyn C

Attributed to: Oxide and chalcogenide MOCVD (metal-organic chemical vapour deposition) funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/pssa.202500608

Publication URI: http://dx.doi.org/10.1002/pssa.202500608

Type: Journal Article/Review

Parent Publication: physica status solidi (a)

Issue: 6