Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction (2010)

First Author: Hyett G

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/cvde.201004298

Publication URI: http://dx.doi.org/10.1002/cvde.201004298

Type: Journal Article/Review

Parent Publication: Chemical Vapor Deposition

Issue: 10-12