Cathode Current Density Distributions in High Power Impulse and Direct Current Magnetron Sputtering Modes (2009)
Attributed to:
Dual Source Pulsed Plasmas for the Production of Ultra-High Performance Coatings
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/ppap.200931201
Publication URI: http://dx.doi.org/10.1002/ppap.200931201
Type: Journal Article/Review
Parent Publication: Plasma Processes and Polymers
Issue: S1