Influence of Substrate Temperature on Structural Properties and Deposition Rate of AlN Thin Film Deposited by Reactive Magnetron Sputtering (2012)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1007/s11664-012-1999-4
Publication URI: http://dx.doi.org/10.1007/s11664-012-1999-4
Type: Journal Article/Review
Parent Publication: Journal of Electronic Materials
Issue: 7