CFD optimisation of up-flow vertical HVPE reactor for GaN growth (2008)
Attributed to:
Growth of thick and flat high quality GaN using nano-column compliant layers
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.jcrysgro.2008.04.017
Publication URI: http://dx.doi.org/10.1016/j.jcrysgro.2008.04.017
Type: Journal Article/Review
Parent Publication: Journal of Crystal Growth
Issue: 14