Atomic layer deposition of TaN and Ta3N5 using pentakis(dimethylamino)tantalum and either ammonia or monomethylhydrazine (2011)
Attributed to:
Atomic layer deposition of Hafnium-nitride and Lanthanide nitrides
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.jcrysgro.2011.07.012
Publication URI: http://dx.doi.org/10.1016/j.jcrysgro.2011.07.012
Type: Journal Article/Review
Parent Publication: Journal of Crystal Growth
Issue: 1