Grain boundary mediated leakage current in polycrystalline HfO2 films (2011)
Attributed to:
Modelling of Advanced Functional Materials using Terascale Computing
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2011.03.024
Publication URI: http://dx.doi.org/10.1016/j.mee.2011.03.024
Type: Journal Article/Review
Parent Publication: Microelectronic Engineering
Issue: 7