Design and fabrication of densely integrated silicon quantum dots using a VLSI compatible hydrogen silsesquioxane electron beam lithography process (2012)
Attributed to:
Silicon-based Integrated Single-Spin Quantum Information Technology
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2012.07.011
Publication URI: http://dx.doi.org/10.1016/j.mee.2012.07.011
Type: Journal Article/Review
Parent Publication: Microelectronic Engineering