Design and fabrication of densely integrated silicon quantum dots using a VLSI compatible hydrogen silsesquioxane electron beam lithography process (2012)

First Author: Lin Y

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2012.07.011

Publication URI: http://dx.doi.org/10.1016/j.mee.2012.07.011

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering