Fullerene-based spin-on-carbon hardmask (2012)

First Author: Frommhold A
Attributed to:  Next Generation Resist Technology for the Semiconductor Industry funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2012.07.019

Publication URI: http://dx.doi.org/10.1016/j.mee.2012.07.019

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering