Evaluation of relaxation and misfit dislocation blocking in strained silicon on virtual substrates (2008)

First Author: Parsons J
Attributed to:  Ultimate Control of Strain Relaxation Processes in SiGe Layers funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.tsf.2008.08.026

Publication URI: http://dx.doi.org/10.1016/j.tsf.2008.08.026

Type: Journal Article/Review

Parent Publication: Thin Solid Films

Issue: 1