Ti3SiC2-formation during Ti-C-Si multilayer deposition by magnetron sputtering at 650 °C (2013)
Attributed to:
A study of methods to produce MAX phases in thin films at temperatures below 700 degrees C
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.vacuum.2013.01.003
Publication URI: http://dx.doi.org/10.1016/j.vacuum.2013.01.003
Type: Journal Article/Review
Parent Publication: Vacuum