📣 Help Shape the Future of UKRI's Gateway to Research (GtR)

We're improving UKRI's Gateway to Research and are seeking your input! If you would be interested in being interviewed about the improvements we're making and to have your say about how we can make GtR more user-friendly, impactful, and effective for the Research and Innovation community, please email gateway@ukri.org.

Ti3SiC2-formation during Ti-C-Si multilayer deposition by magnetron sputtering at 650 °C (2013)

First Author: Vishnyakov V

Attributed to: A study of methods to produce MAX phases in thin films at temperatures below 700 degrees C funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.vacuum.2013.01.003

Publication URI: http://dx.doi.org/10.1016/j.vacuum.2013.01.003

Type: Journal Article/Review

Parent Publication: Vacuum