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High-accuracy analysis of nanoscale semiconductor layers using beam-exit ar-ion polishing and scanning probe microscopy. (2013)

First Author: Robson AJ

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/am400270w

PubMed Identifier: 23528037

Publication URI: http://europepmc.org/abstract/MED/23528037

Type: Journal Article/Review

Volume: 5

Parent Publication: ACS applied materials & interfaces

Issue: 8

ISSN: 1944-8244