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Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors (2008)

First Author: Black K

Attributed to: Liquid injection ALD of Cp- based precursors for deposition of dielectric materials funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/b807205a

Publication URI: http://dx.doi.org/10.1039/b807205a

Type: Journal Article/Review

Parent Publication: Journal of Materials Chemistry

Issue: 38