Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene zirconium and hafnium precursors (2008)
Attributed to:
Liquid injection ALD of Cp- based precursors for deposition of dielectric materials
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1039/b807205a
Publication URI: http://dx.doi.org/10.1039/b807205a
Type: Journal Article/Review
Parent Publication: Journal of Materials Chemistry
Issue: 38