Statistical modelling of the variation in advanced process technologies using a multi-level partitioned response surface approach (2008)

First Author: Shedabale S
Attributed to:  EDA tools for strained Si CMOS cell libraries with variability models funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1049/iet-cds:20080031

Publication URI: http://dx.doi.org/10.1049/iet-cds:20080031

Type: Journal Article/Review

Parent Publication: IET Circuits, Devices & Systems

Issue: 5