Thermal stability of supercritical thickness-strained Si layers on thin strain-relaxed buffers (2007)

First Author: Escobedo-Cousin E
Attributed to:  Nanometre Strain Evaluation for Future and Emerging Technologies funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.2825042

Publication URI: http://dx.doi.org/10.1063/1.2825042

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 12