Energy-band alignment of HfO2/SiO2/SiC gate dielectric stack (2008)

First Author: Mahapatra R
Attributed to:  Technologies for SiC electronics and sensors in extreme environments funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.2839314

Publication URI: http://dx.doi.org/10.1063/1.2839314

Type: Journal Article/Review

Parent Publication: Applied Physics Letters

Issue: 4