Growth of ~5 cm2V-1s-1 mobility, p-type Copper(I) oxide (Cu2O) films by fast atmospheric atomic layer deposition (AALD) at 225°C and below (2012)
Attributed to:
Printed Logic Supply Chain (FlexIC) - TSB App. No. 155
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.4771681
Publication URI: http://dx.doi.org/10.1063/1.4771681
Type: Journal Article/Review
Parent Publication: AIP Advances
Issue: 4